DocumentCode :
2920805
Title :
Optical characteristics of one-dimensional photonic crystals fabricated with high-aspect-ratio Si etching
Author :
Hosomi, Kazuhiko ; Fukamachi, Toshihiko ; Yamada, Hiroji ; Katsuyama, Toshio ; Arakawa, Yasuhiko
Author_Institution :
NCRC, Univ. of Tokyo, Japan; OITDA, Japan; Central Research Laboratory, Hitachi, Ltd, Japan; hosomi.@iis.u-tokyo.ac.jp
fYear :
2005
fDate :
30-02 Aug. 2005
Firstpage :
237
Lastpage :
238
Abstract :
We demonstrate optical properties of one-dimensional photonic crystals which are fabricated by using high-aspect-ratio Si etching. The measured transmission spectrum shows an obvious band gap and is well reproduced by theoretical calculation.
Keywords :
Etching; Light sources; Optical control; Optical device fabrication; Optical fiber polarization; Photonic crystals; Plasma sources; Resists; Sulfur hexafluoride; Wavelength measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2005. CLEO/Pacific Rim 2005. Pacific Rim Conference on
Print_ISBN :
0-7803-9242-6
Type :
conf
DOI :
10.1109/CLEOPR.2005.1569408
Filename :
1569408
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2920805
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