Design and simulation of SiOxNy thin films based planar optical waveguide for integrated optics

From the previous work on the investigation “Ellipsometric and Rutherford back scattering spectroscopy studies of SiO_xN_y Films Elaborated by plasma-enhanced chemical vapor deposition technique”, we present a contribution to the study of a SiO_xN_y thin films based planar optical waveguide. The SiO_xN_y waveguiding layer can be prepared by the same PECVD technique from the following reactive gases: N₂O, NH₃ and SiH₄ at different ratios. Simulation results show that the transverse electric and magnetic waves are quite confined and optical losses are low. We also optimized the dimensions of planar waveguides for a single mode optical waveguide to reduce optical losses.