Development of micro-patterned glass waveguide gratings on III-V compounds for integrated applications

Author

Liu, Jiangchuan ; Lam, Y.L. ; Zhou, Yangzhong ; Chan, Y.C. ; Ooi, Boon S. ; Yao, JingTao ; Yun, Z.S.

Author_Institution

Sch. of Electr. & Electron. Eng., Nanyang Technol. Inst., Singapore

fYear

2000

fDate

7-12 May 2000

Firstpage

186

Lastpage

187

Abstract

Summary form only given.We report on our success in the development of sol-gel derived glass gratings on III-V compound semiconductor wafers with epitaxial quantum wells for optoelectronics fabrication. The adopted fabrication technique of embossing into thin films has been proven to be a practical way for the imprinting of surface corrugation gratings, as well as other integrated optic components by a non-vacuum approach.

Keywords

III-V semiconductors; diffraction gratings; integrated optics; micro-optics; optical fabrication; optical glass; semiconductor quantum wells; sol-gel processing; III-V compound semiconductor wafers; III-V compounds; embossing; epitaxial quantum wells; fabrication technique; integrated applications; integrated optic components; micro-patterned glass waveguide gratings; non-vacuum approach; optoelectronics fabrication; sol-gel derived glass gratings; surface corrugation gratings; thin films; Corrugated surfaces; Embossing; Glass; Gratings; III-V semiconductor materials; Optical device fabrication; Optical surface waves; Optical waveguides; Semiconductor thin films; Semiconductor waveguides;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on

Conference_Location

San Francisco, CA, USA

Print_ISBN

1-55752-634-6

Type

conf

DOI

10.1109/CLEO.2000.906891

Filename

906891