• DocumentCode
    2921688
  • Title

    Monolithically integrated transceivers for 40 Gb/s applications

  • Author

    Streit, Dwight C.

  • Author_Institution
    Velocium, El Segundo, CA, USA
  • Volume
    2
  • fYear
    2002
  • fDate
    10-14 Nov. 2002
  • Abstract
    The ideal solution for full monolithic integration of the transceiver uses selective epitaxy for not only the optical devices, but also for the electronic devices. Optimized InGaAs photodetectors, integrated with InP double-heterojunction bipolar transistors, can be achieved using selective InP-based epitaxy. We have demonstrated monolithic integration of different device types and profiles in the InP material systems using selective regrowth techniques. These techniques are now being applied to achieve higher integration of transceiver components. We present the current state of the art for 40 Gb/s device performance, demonstrate monolithically integrated photoreceivers, and outline the path to full 40 Gb/s transceiver integration.
  • Keywords
    MOCVD; infrared detectors; integrated optoelectronics; optical receivers; optical transmitters; transceivers; vapour phase epitaxial growth; 40 Gbit/s; InGaAs; InP; InP double-heterojunction bipolar transistors; MOVPE; electronic devices; full 40 Gbit/s transceiver integration; monolithically integrated photoreceivers; monolithically integrated transceivers; optical devices; optimized InGaAs photodetectors; selective InP-based epitaxy; selective epitaxy; selective regrowth techniques; transceiver components; Bandwidth; Costs; Digital circuits; Digital modulation; Driver circuits; Epitaxial growth; Indium gallium arsenide; Indium phosphide; Monolithic integrated circuits; Transceivers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society, 2002. LEOS 2002. The 15th Annual Meeting of the IEEE
  • ISSN
    1092-8081
  • Print_ISBN
    0-7803-7500-9
  • Type

    conf

  • DOI
    10.1109/LEOS.2002.1159392
  • Filename
    1159392