DocumentCode :
2921946
Title :
A Methodology for Measuring, Reporting, Navigating, and Analyzing Overall Equipment Productivity (OEP)
Author :
Chakravarthy, Gokul R. ; Keller, Paul N. ; Wheeler, Benjamin R. ; Van Oss, Susan
Author_Institution :
IBM, Hopewell Junction
fYear :
2007
fDate :
11-12 June 2007
Firstpage :
306
Lastpage :
312
Abstract :
This paper will focus on a proposal for a methodology, namely the fab overall equipment productivity (OEP) X-factor Contribution Box (FOX BOXcopy). Based on overall equipment efficiency (OEE) which is already widely in use in the semiconductor industry, the pivotal data analysis tool in this methodology is a two-dimensional, easily comprehensible visualization interface from which the user could readily discern which quadrant each toolset (or equipment) in the fab belongs to, what the extent of its OEP´s deviation from plan is, and hence finally and most importantly which tools provide the most scope for improving the fab´s X-factor (and hence, cycle time).
Keywords :
data analysis; integrated circuit manufacture; productivity; semiconductor device manufacture; OEP analysis; X-factor Contribution Box; comprehensible visualization interface; overall equipment productivity; pivotal data analysis tool; semiconductor industry; Aerodynamics; Availability; Industrial engineering; Navigation; Performance loss; Productivity; Proposals; Pulp manufacturing; Semiconductor device manufacture; Standards development; Capacity Loss Components; Cycle time; Industrial Engineering; Manufacturing Efficiency; Operational Curve; Overall Equipment Efficiency (OEE); Overall Equipment Productivity (OEP); SEMATECH; Tool Utilization; X-factor; X-factor Contribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2007. ASMC 2007. IEEE/SEMI
Conference_Location :
Stresa
Print_ISBN :
1-4244-0652-8
Electronic_ISBN :
1-4244-0653-6
Type :
conf
DOI :
10.1109/ASMC.2007.375055
Filename :
4259221
Link To Document :
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