DocumentCode :
2921962
Title :
CMP Slurry Blending Process Optimization and Cost Improvements using Real-time Concentration Monitoring
Author :
Aparece, Carlo Dominic ; Wacinski, Christopher ; Rajan, Srinath
Author_Institution :
Chartered Semicond. Manuf. Ltd., Singapore
fYear :
2007
fDate :
11-12 June 2007
Firstpage :
320
Lastpage :
325
Abstract :
The approach of this study is to install a realtime concentration monitoring system in a slurry blending system with the main intention of replacing a complex auto-titration system for cost reduction and optimization of the blending process. A Swagelok CR-288 concentration sensor was installed in a Kinetics Slurry Blending System to monitor in real-time the peroxide concentration of the slurry batch from the initial stage of slurry mixing to the final step of supplying the qualified slurry to the CMP polishers. The integration of the realtime concentration sensor in the slurry blending system contributed to a 60% cost reduction in the equipment cost of ownership (COO) as well as the optimization of the blending process parameters.
Keywords :
batch processing (industrial); blending; chemical mechanical polishing; chemical sensors; chemical variables measurement; cost reduction; industrial waste; integrated circuit interconnections; integrated circuit manufacture; quality control; slurries; waste handling equipment; waste management; CMP slurry blending process optimization; Kinetics Slurry Blending System; Swagelok CR-288 concentration sensor; cost improvements; cost reduction; equipment cost of ownership reduction; peroxide concentration monitoring; real-time concentration monitoring; slurry batch process; slurry mixing stage; Chemical analysis; Chemical sensors; Cost function; Monitoring; Optical refraction; Optical sensors; Real time systems; Sampling methods; Semiconductor device manufacture; Slurries; Chemical Mechanical Planarization (CMP); Cost of Ownership (COO); Index of refraction (IoR); Supervisory Control And Data Acquisition (SCADA);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2007. ASMC 2007. IEEE/SEMI
Conference_Location :
Stresa
Print_ISBN :
1-4244-0652-8
Electronic_ISBN :
1-4244-0653-6
Type :
conf
DOI :
10.1109/ASMC.2007.375057
Filename :
4259223
Link To Document :
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