• DocumentCode
    2921962
  • Title

    CMP Slurry Blending Process Optimization and Cost Improvements using Real-time Concentration Monitoring

  • Author

    Aparece, Carlo Dominic ; Wacinski, Christopher ; Rajan, Srinath

  • Author_Institution
    Chartered Semicond. Manuf. Ltd., Singapore
  • fYear
    2007
  • fDate
    11-12 June 2007
  • Firstpage
    320
  • Lastpage
    325
  • Abstract
    The approach of this study is to install a realtime concentration monitoring system in a slurry blending system with the main intention of replacing a complex auto-titration system for cost reduction and optimization of the blending process. A Swagelok CR-288 concentration sensor was installed in a Kinetics Slurry Blending System to monitor in real-time the peroxide concentration of the slurry batch from the initial stage of slurry mixing to the final step of supplying the qualified slurry to the CMP polishers. The integration of the realtime concentration sensor in the slurry blending system contributed to a 60% cost reduction in the equipment cost of ownership (COO) as well as the optimization of the blending process parameters.
  • Keywords
    batch processing (industrial); blending; chemical mechanical polishing; chemical sensors; chemical variables measurement; cost reduction; industrial waste; integrated circuit interconnections; integrated circuit manufacture; quality control; slurries; waste handling equipment; waste management; CMP slurry blending process optimization; Kinetics Slurry Blending System; Swagelok CR-288 concentration sensor; cost improvements; cost reduction; equipment cost of ownership reduction; peroxide concentration monitoring; real-time concentration monitoring; slurry batch process; slurry mixing stage; Chemical analysis; Chemical sensors; Cost function; Monitoring; Optical refraction; Optical sensors; Real time systems; Sampling methods; Semiconductor device manufacture; Slurries; Chemical Mechanical Planarization (CMP); Cost of Ownership (COO); Index of refraction (IoR); Supervisory Control And Data Acquisition (SCADA);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference, 2007. ASMC 2007. IEEE/SEMI
  • Conference_Location
    Stresa
  • Print_ISBN
    1-4244-0652-8
  • Electronic_ISBN
    1-4244-0653-6
  • Type

    conf

  • DOI
    10.1109/ASMC.2007.375057
  • Filename
    4259223