• DocumentCode
    2922778
  • Title

    eFuse Design and Reliability

  • Author

    Tonti, W.

  • fYear
    2008
  • fDate
    12-16 Oct. 2008
  • Firstpage
    145
  • Lastpage
    145
  • Abstract
    Summary form only given. Programmable eFuse designs present an integration challenge in modern CMOS processing. The power level to program a fuse, and the programming methodologies leverage reliability mechanisms which all other elements in a design avoid. A high degree of eFuse process control and circuit design is required in order to guarantee operation. Almost all eFuse types are one time programmable and are limited to "one chance" programmable. This tutorial discussed selected eFuse technologies describing the design philosophy electrical programming and characterization, the physics of failure, and some of the many applications an on chip programmable element provides.
  • Keywords
    CMOS digital integrated circuits; integrated circuit reliability; programmable logic arrays; CMOS processing; eFuse circuit design; eFuse process control; programmable eFuse designs; reliability mechanisms; Circuit testing; Data analysis; Dispersion; High K dielectric materials; High-K gate dielectrics; Negative bias temperature instability; Niobium compounds; Predictive models; Semiconductor device modeling; Titanium compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
  • Conference_Location
    S. Lake Tahoe, CA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4244-2194-7
  • Electronic_ISBN
    1930-8841
  • Type

    conf

  • DOI
    10.1109/IRWS.2008.4796111
  • Filename
    4796111