Title :
eFuse Design and Reliability
Abstract :
Summary form only given. Programmable eFuse designs present an integration challenge in modern CMOS processing. The power level to program a fuse, and the programming methodologies leverage reliability mechanisms which all other elements in a design avoid. A high degree of eFuse process control and circuit design is required in order to guarantee operation. Almost all eFuse types are one time programmable and are limited to "one chance" programmable. This tutorial discussed selected eFuse technologies describing the design philosophy electrical programming and characterization, the physics of failure, and some of the many applications an on chip programmable element provides.
Keywords :
CMOS digital integrated circuits; integrated circuit reliability; programmable logic arrays; CMOS processing; eFuse circuit design; eFuse process control; programmable eFuse designs; reliability mechanisms; Circuit testing; Data analysis; Dispersion; High K dielectric materials; High-K gate dielectrics; Negative bias temperature instability; Niobium compounds; Predictive models; Semiconductor device modeling; Titanium compounds;
Conference_Titel :
Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
Conference_Location :
S. Lake Tahoe, CA
Print_ISBN :
978-1-4244-2194-7
Electronic_ISBN :
1930-8841
DOI :
10.1109/IRWS.2008.4796111
