Title :
Characterization of dynamic spatial conduction patterns on ESD protection circuitry by photon-counting imaging
Author :
Yap, B.C. ; Jeng, J.K. ; Chang, Laurence L S
Author_Institution :
Ind. Technol. Res. Inst., Hsinchu, Taiwan
fDate :
March 31 1992-April 2 1992
Abstract :
A photon-counting imaging method has been effectively employed to acquire the extremely weak pulse electroluminescence from a thick-field-oxide electrostatic discharge (ESD) protection device during very short pulse stressing. From this, its dynamic spatial conduction patterns with respect to different currents, pulse widths, and repetition rates could then be directly visualized and assessed. The authors have applied such an imaging method successfully in the acquisition of a full series of spatial pulsed emission patterns on circuitry during ESD simulation. This could offer a means for direct, simultaneous observation of emerging failure on such a device. The exact sequential turning-on nature of bipolar NPN snapback, on each ladder-channel and its non-uniformity in spread during different levels and widths of pulsation could also be resolved directly. The authors report on the accurate determination of the site of the resistive short on failed samples by this technique.<>
Keywords :
electroluminescence; electrostatic discharge; overvoltage protection; photon counting; ESD protection circuitry; ESD protection device; ESD simulation; bipolar NPN snapback; characterisation; currents; dynamic spatial conduction patterns; emerging failure; ladder-channel; photon-counting imaging; pulse widths; repetition rates; sequential turning-on; simultaneous observation; spatial pulsed emission patterns; thick-field oxide NMOS device; very short pulse stressing; weak pulse electroluminescence; Biological system modeling; Circuits; Electrostatic discharge; Failure analysis; Microscopy; Optical imaging; Pattern analysis; Protection; Testing; Very large scale integration;
Conference_Titel :
Reliability Physics Symposium 1992. 30th Annual Proceedings., International
Conference_Location :
San Diego, CA, USA
Print_ISBN :
0-7803-0473-X
DOI :
10.1109/RELPHY.1992.187655