Title :
Implementation of Polycrystalline X-Ray Diffraction for Semiconductor Metrology
Author :
DeHaven, P.W. ; Jeanneret, M. ; Gittleman, B. ; Kozaczek, K.
Author_Institution :
IBM Corp., Hopewell Junction
Abstract :
This paper describes the implementation of a first generation inline X-ray diffractometer for the characterization of polycrystalline thin films. The tool is able to provide quantitative structural data on either blanket or patterned wafers, which allows it to serve as a routine line monitor, or as an analytical probe for process development, tool matching, or problem diagnostics.
Keywords :
X-ray diffractometers; semiconductor device measurement; thin films; X ray diffractometer; polycrystalline thin films; problem diagnostics; process development; quantitative structural data; routine line monitor; semiconductor metrology; tool matching; Crystalline materials; Crystallization; Detectors; Grain size; Metrology; Monitoring; Probes; Structural beams; X-ray diffraction; X-ray scattering;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2007. ASMC 2007. IEEE/SEMI
Conference_Location :
Stresa
Print_ISBN :
1-4244-0652-8
Electronic_ISBN :
1-4244-0653-6
DOI :
10.1109/ASMC.2007.375106
