Title :
Non absorbing mirror laser with improved catastrophic optical damage level
Author :
Walker, C.L. ; Bryce, A.C. ; Marsh, J.H.
Author_Institution :
Dept. of Electron. & Electr. Eng., Glasgow Univ., UK
Abstract :
We demonstrate an 860 nm high brightness non absorbing mirror ridge laser fabricated using defect induced quantum well intermixing, giving an improved catastrophic optical damage level by a factor of 2.6.
Keywords :
brightness; laser beam effects; laser mirrors; laser transitions; quantum well lasers; ridge waveguides; waveguide lasers; 860 nm; AlGaAs; GaAs; catastrophic optical damage level; defect induced quantum well intermixing; double quantum well laser; high brightness; high brightness semiconductor lasers; improved catastrophic optical damage level; laser mirrors; nonabsorbing mirror laser; ridge laser; ridge waveguide laser; Absorption; Degradation; Erbium-doped fiber lasers; Laser modes; Mirrors; Optical materials; Optical pumping; Power lasers; Quantum well lasers; Stimulated emission;
Conference_Titel :
Lasers and Electro-Optics Society, 2002. LEOS 2002. The 15th Annual Meeting of the IEEE
Print_ISBN :
0-7803-7500-9
DOI :
10.1109/LEOS.2002.1159470
