DocumentCode
2924850
Title
Efficient high-temperature CW operation of oxide-confined long-wavelength InAs quantum dot lasers
Author
Huang, Xumin ; Stingz, A. ; Hains, Chris P. ; Cheng, James ; Malloy, K.J.
Author_Institution
Center for High Technol. Mater., New Mexico Univ., Albuquerque, NM, USA
fYear
2000
fDate
7-12 May 2000
Firstpage
348
Lastpage
349
Abstract
Summary form only given. Intensive research has been conducted in improving the performance of quantum dot (QD) lasers. We describe the achievement of efficient CW lasing at /spl lambda//spl ap/1.28 /spl mu/m by narrow-stripe, laterally-oxide-confined QD lasers containing two InAs quantum dot-in-well (DWELL) layers, with very low threshold current density (24 A/cm/sup 2/), high differential efficiency (55%), and a wide temperature range for CW operation (T/sub max/>100/spl deg/C). The QD laser was grown by solid-source MBE and has an oxide-confined device structure. The active region consists of two InAs DWELL layers separated by a 30 nm GaAs barrier layer, which is situated in the middle of a 220 nm thick GaAs waveguide bounded by AlGaAs cladding layers.
Keywords
III-V semiconductors; current density; indium compounds; laser beams; molecular beam epitaxial growth; optical fabrication; quantum well lasers; semiconductor quantum dots; waveguide lasers; 1.28 mum; 100 C; 55 percent; AlGaAs; AlGaAs cladding layers; CW operation; DWELL layers; GaAs; GaAs barrier layer; GaAs waveguide; InAs; InAs quantum dot lasers; InAs quantum dot-in-well layers; active region; differential efficiency; efficient CW lasing; high-temperature CW operation; narrow-stripe laterally-oxide-confined quantum dot lasers; oxide-confined device structure; oxide-confined long-wavelength InAs quantum dot lasers; performance; solid-source MBE; temperature range; threshold current density; Open systems; Quantum dot lasers; Quantum dots; US Department of Transportation;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
1-55752-634-6
Type
conf
DOI
10.1109/CLEO.2000.907099
Filename
907099
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