DocumentCode :
2925897
Title :
CAD challenges for 3D ICs
Author :
Kung, David ; Puri, Ruchir
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY
fYear :
2009
fDate :
19-22 Jan. 2009
Firstpage :
421
Lastpage :
422
Abstract :
A fundamental shift in the technology has occurred at 90 nm CMOS and beyond where the interconnect resistance has been increasing so much that the distance a clock cycle can reach has been dwindling as a fraction of the dimension of the chip. to cause a repeater explosion problem. This problem translates into an explosion of repeaters which not only added significant overhead in area but also power, as repeaters are major contributors to leakage. By reaching out to the vertical dimension, 3D technology has the potential of easing repeater explosion (Figure 1), reducing latency between units, increasing memory bandwidth and integrating heterogeneous technologies. However, in order to exploit the full potential of 3D technology, new challenges in the area of system level design and analysis, physical design, thermal analysis need to be addressed.
Keywords :
CMOS integrated circuits; circuit CAD; integrated circuit interconnections; thermal analysis; 3D integrated circuit; CMOS integrated circuit; circuit CAD; clock cycle; interconnect resistance; physical design; repeater explosion; size 90 nm; system level design; thermal analysis; Bandwidth; CMOS technology; Clocks; Costs; Delay; Explosions; Logic; Performance analysis; Repeaters; System-level design;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2009. ASP-DAC 2009. Asia and South Pacific
Conference_Location :
Yokohama
Print_ISBN :
978-1-4244-2748-2
Electronic_ISBN :
978-1-4244-2749-9
Type :
conf
DOI :
10.1109/ASPDAC.2009.4796517
Filename :
4796517
Link To Document :
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