Title :
9.5: Microfabrication of a 220 GHz grating for sheet beam amplifiers
Author :
Joye, Colin D. ; Calame, Jeffrey P. ; Garven, Morag ; Park, Doewon ; Bass, Robert ; Levush, Baruch
Author_Institution :
Naval Res. Lab., Washington, DC, USA
Abstract :
A 50 watt CW 220 GHz sheet beam amplifier is under development at NRL. We report on microfabrication techniques used to construct a grating-based amplifier circuit using Ultraviolet Lithography (UV-LIGA) and Deep Reactive Ion etching (DRIE).
Keywords :
electron beams; microfabrication; sputter etching; ultraviolet lithography; deep reactive ion etching; frequency 200 GHz; grating-based amplifier circuit; microfabrication; sheet beam amplifiers; ultraviolet lithography; Bandwidth; Circuits; Copper; Dispersion; Electron beams; Etching; Geometry; Gratings; Thermal conductivity; Voltage; SU-8; Sheet beam; UV-LIGA; millimeter wave; slow-wave amplifier;
Conference_Titel :
Vacuum Electronics Conference (IVEC), 2010 IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-7098-3
DOI :
10.1109/IVELEC.2010.5503539
