DocumentCode
2927319
Title
9.2: Fabrication techniques for a THz EIK
Author
Dobbs, Richard ; Roitman, Albert ; Horoyski, Peter ; Hyttinen, Mark ; Sweeney, Dan ; Chernin, David ; Blank, Monica ; Barker, N. Scott ; Booske, John ; Wright, Edward ; Calame, Jeffrey ; Makarova, Olga V.
Author_Institution
Commun. & Power Ind. Canada, Georgetown, ON, Canada
fYear
2010
fDate
18-20 May 2010
Firstpage
181
Lastpage
182
Abstract
To produce an EIK working at THz frequencies, departure from traditional fabrication techniques is required. This paper describes the investigation and results of various fabrication techniques and their suitability for application in a VED.
Keywords
klystrons; ultraviolet lithography; EIK; fabrication techniques; terahertz frequency; Bonding; Circuits; Electrodes; Fabrication; Frequency; Laboratories; Power industry; Resists; Wire; X-ray lithography; EDM; EIK; Micromachining; THz; UV Lithography; X-Ray Lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference (IVEC), 2010 IEEE International
Conference_Location
Monterey, CA
Print_ISBN
978-1-4244-7098-3
Type
conf
DOI
10.1109/IVELEC.2010.5503544
Filename
5503544
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