• DocumentCode
    2927946
  • Title

    1.5-V Operating fully-depleted amorphous oxide thin film transistors achieved by 63-mV/dec subthreshold slope

  • Author

    Kawamura, T. ; Uchiyama, H. ; Saito, S. ; Wakana, H. ; Mine, T. ; Hatano, M. ; Torii, K. ; Onai, T.

  • Author_Institution
    Central Res. Lab., Hitachi, Ltd., Kokubunji
  • fYear
    2008
  • fDate
    15-17 Dec. 2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Thin film transistors (TFTs) with a small subthreshold slope (SS) are urgently required for low-voltage operating circuits on large-area and flexible substrates. Using InGaZnO deposited at room temperature (RT), we achieved 63 mV/dec, the smallest-ever SS reported for oxide semiconductor TFTs. To achieve the small SS as well as small Ioff, a fully-depleted off-state was employed by thinning the channel layer to 6 nm. Scalability down to L = 2 mum was confirmed. For Vg = 0 to 1.5 V operation, Ioff <10-17 A/mum and on/off ratio > 108 were obtained.
  • Keywords
    II-VI semiconductors; amorphous semiconductors; gallium compounds; indium compounds; low-power electronics; thin film transistors; wide band gap semiconductors; zinc compounds; InGaZnO; TFT; channel layer; flexible substrate; fully-depleted amorphous oxide thin film transistors; fully-depleted off-state; large-area substrate; low-voltage operating circuits; on-off ratio; oxide semiconductor; subthreshold slope; voltage 1.5 V; Amorphous magnetic materials; Amorphous materials; Annealing; Fabrication; Insulation; Plasma temperature; Radio frequency; Sputtering; Thin film transistors; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2008. IEDM 2008. IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    8164-2284
  • Print_ISBN
    978-1-4244-2377-4
  • Electronic_ISBN
    8164-2284
  • Type

    conf

  • DOI
    10.1109/IEDM.2008.4796618
  • Filename
    4796618