DocumentCode :
2928085
Title :
Enhanced UV Laser-Induced Damage Tolerance in CsLiB6O10by Reducing Water Molecule Impurities in the Crystal Volume
Author :
Kanoh, A. ; Yoshimura, M. ; Nhisioka, M. ; Mori, Y. ; Sasaki, T. ; Katsura, T. ; Kojima, T. ; Nishimae, J.
Author_Institution :
Osaka University, Japan
fYear :
2005
fDate :
30-02 Aug. 2005
Firstpage :
1669
Lastpage :
1670
Abstract :
We revealed the harmful effects of water molecules in CsLiB6O10crystal volume on ultraviolet light generation. The reduction of impurities results in lowering nonlinear absorption at 266 nm and significantly enhancing the laser-induced damage tolerance.
Keywords :
Crystals; Degradation; Electromagnetic wave absorption; Impurities; Laboratories; Nonlinear optics; Optical devices; Surface cracks; Temperature; Water heating;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2005. CLEO/Pacific Rim 2005. Pacific Rim Conference on
Print_ISBN :
0-7803-9242-6
Type :
conf
DOI :
10.1109/CLEOPR.2005.1569846
Filename :
1569846
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2928085
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