Title :
Silica-based films and multilayer stacks for lightwave circuits fabricated by surface-plasma chemical vapor deposition
Author_Institution :
Fiber Opt. Res. Center, Russian Acad. of Sci., Moscow
Abstract :
Peculiarities of the application of SPCVD to the fabrication of doped silica films for the use in integrated optics are discussed. Photosensitive germanosilicate films, heavily erbium doped layers, multilayer film structures are considered as examples.
Keywords :
dielectric thin films; erbium; germanium compounds; integrated optics; optical multilayers; plasma CVD; silicon compounds; GeO-SiO; JkJk:Er; doped silica; heavily erbium doped layers; integrated optics; lightwave circuits; multilayer film structures; photosensitive germanosilicate films; surface-plasma chemical vapor deposition; Chemical technology; Chemical vapor deposition; Circuits; Nonhomogeneous media; Optical films; Optical surface waves; Optical waveguides; Plasma applications; Plasma chemistry; Substrates;
Conference_Titel :
IEEE/LEOS Winter Topical Meeting Series, 2008
Conference_Location :
Sorrento
Print_ISBN :
978-1-4244-1594-6
Electronic_ISBN :
978-1-4244-1595-3
DOI :
10.1109/LEOSWT.2008.4444381
