DocumentCode
2928121
Title
Silica-based films and multilayer stacks for lightwave circuits fabricated by surface-plasma chemical vapor deposition
Author
Golant, K.M.
Author_Institution
Fiber Opt. Res. Center, Russian Acad. of Sci., Moscow
fYear
2008
fDate
14-16 Jan. 2008
Firstpage
24
Lastpage
25
Abstract
Peculiarities of the application of SPCVD to the fabrication of doped silica films for the use in integrated optics are discussed. Photosensitive germanosilicate films, heavily erbium doped layers, multilayer film structures are considered as examples.
Keywords
dielectric thin films; erbium; germanium compounds; integrated optics; optical multilayers; plasma CVD; silicon compounds; GeO-SiO; JkJk:Er; doped silica; heavily erbium doped layers; integrated optics; lightwave circuits; multilayer film structures; photosensitive germanosilicate films; surface-plasma chemical vapor deposition; Chemical technology; Chemical vapor deposition; Circuits; Nonhomogeneous media; Optical films; Optical surface waves; Optical waveguides; Plasma applications; Plasma chemistry; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
IEEE/LEOS Winter Topical Meeting Series, 2008
Conference_Location
Sorrento
Print_ISBN
978-1-4244-1594-6
Electronic_ISBN
978-1-4244-1595-3
Type
conf
DOI
10.1109/LEOSWT.2008.4444381
Filename
4444381
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