DocumentCode :
2928259
Title :
Rugged Dotted-channel LDMOS structure
Author :
Khan, Tahir ; Khemka, Vishnu ; Zhu, Ronghua ; Bose, Abe
Author_Institution :
SMARTMOS Technol. Center, Freescale Semicond., Tempe, AZ
fYear :
2008
fDate :
15-17 Dec. 2008
Firstpage :
1
Lastpage :
4
Abstract :
This paper presents the extremely robust and innovative dotted-channel structure which utilizes a unique approach of suppressing the parasitic bipolar to significantly improve the SOA and push the boundaries of LDMOS operation to a new realm. The structure has body contact placed through the poly-silicon gate of the standard MOSFET resulting in a hole (h+) collection site in front of the source which in turn shunts the base emitter path of the parasitic bipolar.
Keywords :
MOSFET; MOSFET; SOA; parasitic bipolar suppression; poly-silicon gate; rugged dotted-channel LDMOS structure; Automotive applications; Degradation; Delay; Electric breakdown; Hot carriers; Immune system; Kirk field collapse effect; MOSFET circuits; Robustness; Semiconductor optical amplifiers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2008. IEDM 2008. IEEE International
Conference_Location :
San Francisco, CA
ISSN :
8164-2284
Print_ISBN :
978-1-4244-2377-4
Electronic_ISBN :
8164-2284
Type :
conf
DOI :
10.1109/IEDM.2008.4796632
Filename :
4796632
Link To Document :
بازگشت