• DocumentCode
    2930195
  • Title

    Impact of electrical degradation on trapping characteristics of GaN high electron mobility transistors

  • Author

    Joh, Jungwoo ; del Alamo, Jesús A.

  • Author_Institution
    Microsyst. Technol. Labs., MIT, Cambridge, MA
  • fYear
    2008
  • fDate
    15-17 Dec. 2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    One of the most deleterious effects of electrical degradation of GaN HEMTs is an increase in carrier trapping and subsequent current collapse. In this work, we have investigated the trapping and detrapping characteristics of GaN HEMTs before and after device degradation through a new current transient analysis methodology. We have found that electrical stress beyond a critical voltage significantly enhances trapping behavior inside the AlGaN barrier layer or at the surface. However, trapping in the buffer was found to be intact after device degradation.
  • Keywords
    III-V semiconductors; aluminium compounds; electron traps; gallium compounds; high electron mobility transistors; transient analysis; wide band gap semiconductors; AlGaN; carrier trapping; current collapse; current transient analysis; device degradation; electrical degradation; high electron mobility transistors; Aluminum gallium nitride; Degradation; Electron traps; Gallium nitride; HEMTs; MODFETs; Pulse measurements; Temperature; Transient analysis; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2008. IEDM 2008. IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    8164-2284
  • Print_ISBN
    978-1-4244-2377-4
  • Electronic_ISBN
    8164-2284
  • Type

    conf

  • DOI
    10.1109/IEDM.2008.4796725
  • Filename
    4796725