DocumentCode
2930195
Title
Impact of electrical degradation on trapping characteristics of GaN high electron mobility transistors
Author
Joh, Jungwoo ; del Alamo, Jesús A.
Author_Institution
Microsyst. Technol. Labs., MIT, Cambridge, MA
fYear
2008
fDate
15-17 Dec. 2008
Firstpage
1
Lastpage
4
Abstract
One of the most deleterious effects of electrical degradation of GaN HEMTs is an increase in carrier trapping and subsequent current collapse. In this work, we have investigated the trapping and detrapping characteristics of GaN HEMTs before and after device degradation through a new current transient analysis methodology. We have found that electrical stress beyond a critical voltage significantly enhances trapping behavior inside the AlGaN barrier layer or at the surface. However, trapping in the buffer was found to be intact after device degradation.
Keywords
III-V semiconductors; aluminium compounds; electron traps; gallium compounds; high electron mobility transistors; transient analysis; wide band gap semiconductors; AlGaN; carrier trapping; current collapse; current transient analysis; device degradation; electrical degradation; high electron mobility transistors; Aluminum gallium nitride; Degradation; Electron traps; Gallium nitride; HEMTs; MODFETs; Pulse measurements; Temperature; Transient analysis; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2008. IEDM 2008. IEEE International
Conference_Location
San Francisco, CA
ISSN
8164-2284
Print_ISBN
978-1-4244-2377-4
Electronic_ISBN
8164-2284
Type
conf
DOI
10.1109/IEDM.2008.4796725
Filename
4796725
Link To Document