DocumentCode :
2930512
Title :
Edge chemistry engineering of graphene nanoribbon transistors: A computational study
Author :
Ouyang, Yijian ; Yoon, Youngki ; Guo, Jing
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Florida, Gainesville, FL
fYear :
2008
fDate :
15-17 Dec. 2008
Firstpage :
1
Lastpage :
4
Abstract :
Using the density-functional theory (DFT) simulation and a top-of-the-barrier ballistic transport model, we present a simulation framework for assessing the performance limits of graphene nanoribbon (GNR) FETs with edges terminated by different chemical species. We find significant effects of edge chemistry on the quantum capacitance, carrier injection velocity, channel conductance and balance between the nFET and the pFET of GNRFETs. The H termination is identified to have the largest on current, carrier injection velocity, and the best balance between the nFET and the pFET with typical solid state gating technologies.
Keywords :
carbon; density functional theory; field effect transistors; nanostructured materials; C; carrier injection velocity; channel conductance; density-functional theory; edge chemistry engineering; graphene nanoribbon transistors; quantum capacitance; top-of-the-barrier ballistic transport model; Ballistic transport; Chemical engineering; Chemical technology; Computational modeling; Computer simulation; FETs; Photonic band gap; Plasma chemistry; Quantum capacitance; Solid state circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2008. IEDM 2008. IEEE International
Conference_Location :
San Francisco, CA
ISSN :
8164-2284
Print_ISBN :
978-1-4244-2377-4
Electronic_ISBN :
8164-2284
Type :
conf
DOI :
10.1109/IEDM.2008.4796739
Filename :
4796739
Link To Document :
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