DocumentCode
2931023
Title
Femtosecond micro-machining of high index and photo-sensitive glasses in air
Author
Shah, L. ; Richardson, M. ; Tawney, J. ; Richardson, K.
Author_Institution
Sch. of Opt., Central Florida Univ., Orlando, FL, USA
fYear
2000
fDate
7-12 May 2000
Firstpage
613
Lastpage
614
Abstract
Summary form only given. It is well-known that micromachining with high intensity femtosecond pulses has significant advantages over nanosecond laser pulses including increased ablation rates although there are many complex interaction processes involved. They have been shown to be effective in creating microstructures in fused silica, particularly gratings. We are investigating the interaction of high intensity (/spl sim/10/sup 14/ W/cm/sup 2/) 110 fs laser pulses with a variety of glasses to determine their potential for detailed structural micro-fabrication in transparent media, and through analysis of the changes in material structure and chemical properties, assess the interaction processes involved.
Keywords
high-speed optical techniques; laser ablation; laser beam machining; laser materials processing; micromachining; optical fabrication; optical glass; transparency; 110 fs; SiO/sub 2/; ablation rates; air; chemical properties; complex interaction processes; femtosecond micro-machining; fused silica; gratings; high index glasses; high intensity femtosecond laser pulses; high intensity femtosecond pulses; interaction processes; material structure; micromachining; microstructures; nanosecond laser pulses; photo-sensitive glasses; structural micro-fabrication; transparent media; Chemical analysis; Chemical lasers; Glass; Gratings; Laser ablation; Laser transitions; Micromachining; Microstructure; Optical pulses; Silicon compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
1-55752-634-6
Type
conf
DOI
10.1109/CLEO.2000.907462
Filename
907462
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