Bulk periodically poled MgO:LiNbO/sub 3/ with high optical damage resistance

Author

Nihei, Y. ; Harada, A. ; Kamiyama, Kazuto

Author_Institution

Miyanodai Technol. Dev. Center, Fuji Photo Film Co. Ltd., Kanagawa, Japan

fYear

2000

fDate

7-12 May 2000

Firstpage

632

Abstract

Summary form only given. We proposed and demonstrated a novel corona discharge method for the fabrication of bulk periodically poled MgO doped LiNbO/sub 3/ (PPMGLN). We successfully fabricated bulk PPMGLN with a period of 4.7 /spl mu/m for wavelength of 473 nm and 7.0 /spl mu/m for wavelength of 532 nm. Using this PPMGLN we have newly developed blue and green solid-state lasers and they have been used for high-speed color photographic printers in Digital Lab System FRONTIER. It is known that MgO doped LiNbO/sub 3/ (MgO-LN) substrate has high resistance to optical damage. However except for corona discharge method, it is generally difficult to fabricate the bulk PPMGLN. We have made clear of the mechanism of domain inversion of Z-cut MgO-LN.

Keywords

corona; dielectric polarisation; electric domains; electrical resistivity; laser beam effects; lithium compounds; magnesium compounds; optical harmonic generation; 473 nm; 532 nm; LiNbO/sub 3/:MgO; SHG efficiency; Z-cut crystal; bulk periodically poled MgO:LiNbO/sub 3/; corona discharge method; domain inversion mechanism; electrical resistivity; fabrication; high optical damage resistance; solid-state lasers; Corona; High speed optical techniques; Optical device fabrication; Printers; Solid lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on

Conference_Location

San Francisco, CA, USA

Print_ISBN

1-55752-634-6

Type

conf

DOI

10.1109/CLEO.2000.907486

Filename

907486