• DocumentCode
    2932990
  • Title

    Multi-view reconstruction under varying illumination conditions

  • Author

    Wu, Chenglei ; Liu, Yebin ; Ji, Xiangyang ; Dai, Qionghai

  • Author_Institution
    Dept. of Autom., Tsinghua Univ., Beijing, China
  • fYear
    2009
  • fDate
    June 28 2009-July 3 2009
  • Firstpage
    930
  • Lastpage
    933
  • Abstract
    This paper addresses the problem of complete and detailed 3D model reconstruction of objects filmed by multiple cameras under varying illumination. Firstly, initial normal maps are obtained to enhance the correspondence mapping. Then, the depth for every pixel is estimated by combining photometric constraint with occlusion robust photo-consistency. Finally, after filtering the point cloud, a Poisson surface reconstruction is applied to obtain a watertight mesh. In contrast with traditional photometric stereo techniques, the proposed algorithm does not directly calculate the photometric normal but integrates the photometric constraint into the depth estimation. Furthermore, different from classic multi-view stereo (MVS), we consider the counterpart under changing light conditions. The algorithm has been implemented based on our multi-camera and multi-light acquisition system. We validate the method by complete reconstruction of challenging real objects and show experimentally that this technique can greatly improve on correspondence-based MVS results.
  • Keywords
    cameras; image reconstruction; stereo image processing; stochastic processes; 3D model reconstruction; Poisson surface reconstruction; multilight acquisition system; multiple camera; multiview reconstruction; object film reconstruction; photometric stereo techniques; varying illumination condition; Cameras; Clouds; Image reconstruction; Lighting; Photometry; Robustness; Shape; Stereo image processing; Stereo vision; Surface reconstruction; Multi-view stereo; photometric constraint; point cloud;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Multimedia and Expo, 2009. ICME 2009. IEEE International Conference on
  • Conference_Location
    New York, NY
  • ISSN
    1945-7871
  • Print_ISBN
    978-1-4244-4290-4
  • Electronic_ISBN
    1945-7871
  • Type

    conf

  • DOI
    10.1109/ICME.2009.5202648
  • Filename
    5202648