• DocumentCode
    2937171
  • Title

    Numerical Simulation on the Voltage Response of Field Effect Transistor by Focused Terahertz Radiation

  • Author

    Yan, Zhifeng ; Zhu, Jingxuan ; Wang, Yinglei ; Lin, Xinnan ; He, Jin

  • Author_Institution
    Key Lab. of Integrated Microsyst., Peking Univ., Shenzhen, China
  • fYear
    2010
  • fDate
    19-21 June 2010
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    A numerical method is proposed to simulate the corresponding terahertz photoresponse which is induced by radiations between source-and-gate and gate-and-drain electrodes in field effect transistors. Simulations illustrate that the response of terahertz radiation in field effect transistor depends on the gate bias. The response contains contributions of different polarities which induced by radiations between `source and gate electrodes´ and `gate and drain electrodes´ respectively. The simulation matches well with the existing theory quantitatively. The proposed method is also used to study the response in resonant region by changing some parameters of field effect transistors (FET). The results illustrate that it is a useful tool in THz detector design and optimization.
  • Keywords
    electrodes; field effect transistors; numerical analysis; terahertz wave detectors; THz detector design; THz detector optimization; field effect transistor; focused terahertz radiation; gate bias; gate-and-drain electrode; numerical simulation; polarity; resonant region; source-and-gate electrode; terahertz photoresponse; voltage response; Electrodes; Equivalent circuits; FETs; Frequency; Laboratories; Numerical simulation; Plasma simulation; Plasma waves; Radiation detectors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics and Optoelectronic (SOPO), 2010 Symposium on
  • Conference_Location
    Chengdu
  • Print_ISBN
    978-1-4244-4963-7
  • Electronic_ISBN
    978-1-4244-4964-4
  • Type

    conf

  • DOI
    10.1109/SOPO.2010.5504154
  • Filename
    5504154