DocumentCode :
2937171
Title :
Numerical Simulation on the Voltage Response of Field Effect Transistor by Focused Terahertz Radiation
Author :
Yan, Zhifeng ; Zhu, Jingxuan ; Wang, Yinglei ; Lin, Xinnan ; He, Jin
Author_Institution :
Key Lab. of Integrated Microsyst., Peking Univ., Shenzhen, China
fYear :
2010
fDate :
19-21 June 2010
Firstpage :
1
Lastpage :
5
Abstract :
A numerical method is proposed to simulate the corresponding terahertz photoresponse which is induced by radiations between source-and-gate and gate-and-drain electrodes in field effect transistors. Simulations illustrate that the response of terahertz radiation in field effect transistor depends on the gate bias. The response contains contributions of different polarities which induced by radiations between `source and gate electrodes´ and `gate and drain electrodes´ respectively. The simulation matches well with the existing theory quantitatively. The proposed method is also used to study the response in resonant region by changing some parameters of field effect transistors (FET). The results illustrate that it is a useful tool in THz detector design and optimization.
Keywords :
electrodes; field effect transistors; numerical analysis; terahertz wave detectors; THz detector design; THz detector optimization; field effect transistor; focused terahertz radiation; gate bias; gate-and-drain electrode; numerical simulation; polarity; resonant region; source-and-gate electrode; terahertz photoresponse; voltage response; Electrodes; Equivalent circuits; FETs; Frequency; Laboratories; Numerical simulation; Plasma simulation; Plasma waves; Radiation detectors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics and Optoelectronic (SOPO), 2010 Symposium on
Conference_Location :
Chengdu
Print_ISBN :
978-1-4244-4963-7
Electronic_ISBN :
978-1-4244-4964-4
Type :
conf
DOI :
10.1109/SOPO.2010.5504154
Filename :
5504154
Link To Document :
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