DocumentCode
2938153
Title
High Frequency Characterization of Compact N+Poly/Nwell Varactor Using Waffle-Layout
Author
Morandini, Yvan ; Larchanche, Jean-François ; Gaquière, Christophe
Author_Institution
STMicroelectron., Crolles
fYear
2008
fDate
23-25 Jan. 2008
Firstpage
167
Lastpage
170
Abstract
The high frequency characterization of a new waffle layout for N+Poly/Nwell varactor has been studied in STMicroelectronics 65 nm CMOS process. We compare this new waffle layout with model of standard multifingers varactor. In addition to the area saving, the waffle MOS varactor also provides enhancement to the RF merit figure of varactor through the serial resistance and substrate capacitance improvement.
Keywords
varactors; N+Poly/Nwell varactor; STMicroelectronics 65 nm CMOS process; high frequency characterization; waffle MOS varactor; waffle-layout; CMOS process; CMOS technology; Fingers; Matrix converters; Parasitic capacitance; Plugs; Q factor; Radio frequency; Semiconductor device modeling; Varactors;
fLanguage
English
Publisher
ieee
Conference_Titel
Silicon Monolithic Integrated Circuits in RF Systems, 2008. SiRF 2008. IEEE Topical Meeting on
Conference_Location
Orlando, FL
Print_ISBN
978-1-4244-1855-8
Electronic_ISBN
978-1-4244-1856-5
Type
conf
DOI
10.1109/SMIC.2008.48
Filename
4446282
Link To Document