Title :
High Frequency Characterization of Compact N+Poly/Nwell Varactor Using Waffle-Layout
Author :
Morandini, Yvan ; Larchanche, Jean-François ; Gaquière, Christophe
Author_Institution :
STMicroelectron., Crolles
Abstract :
The high frequency characterization of a new waffle layout for N+Poly/Nwell varactor has been studied in STMicroelectronics 65 nm CMOS process. We compare this new waffle layout with model of standard multifingers varactor. In addition to the area saving, the waffle MOS varactor also provides enhancement to the RF merit figure of varactor through the serial resistance and substrate capacitance improvement.
Keywords :
varactors; N+Poly/Nwell varactor; STMicroelectronics 65 nm CMOS process; high frequency characterization; waffle MOS varactor; waffle-layout; CMOS process; CMOS technology; Fingers; Matrix converters; Parasitic capacitance; Plugs; Q factor; Radio frequency; Semiconductor device modeling; Varactors;
Conference_Titel :
Silicon Monolithic Integrated Circuits in RF Systems, 2008. SiRF 2008. IEEE Topical Meeting on
Conference_Location :
Orlando, FL
Print_ISBN :
978-1-4244-1855-8
Electronic_ISBN :
978-1-4244-1856-5
DOI :
10.1109/SMIC.2008.48
