Title :
Writing a chromium superlattice with light forces
Author :
Schulze, Thomas ; Brezger, B. ; Muther, T. ; Jurgens, D. ; Oberthaler, M. ; Pfau, T. ; Mlynek, J.
Author_Institution :
Fachbereich Phys., Konstanz Univ., Germany
Abstract :
Summary form only given. In atom lithography the conventional roles played by light and matter are reversed: a mask of light is used to pattern a beam of neutral atoms. Up to now, atom lithography has yielded only structures periodic in one or two dimensions, with a typical period of /spl lambda//2 or even below. We report the generation of various chromium structures with quadratic symmetry and the first realization of a superlattice structure using light forces.
Keywords :
chromium; lithography; masks; metallic superlattices; nanotechnology; radiation pressure; AFM; Cr; atom lithography; light forces; mask of light; neutral atom beam; quadratic symmetry structures; standing light waves; superlattice writing; Arm; Atomic measurements; Chromium; Collaboration; Electrons; Hydrogen; Physics; Spontaneous emission; Superlattices; Writing;
Conference_Titel :
Quantum Electronics Conference, 2000. Conference Digest. 2000 International
Conference_Location :
Nice, France
Print_ISBN :
0-7803-6318-3
DOI :
10.1109/IQEC.2000.907950
