DocumentCode
2938409
Title
Writing a chromium superlattice with light forces
Author
Schulze, Thomas ; Brezger, B. ; Muther, T. ; Jurgens, D. ; Oberthaler, M. ; Pfau, T. ; Mlynek, J.
Author_Institution
Fachbereich Phys., Konstanz Univ., Germany
fYear
2000
fDate
10-15 Sept. 2000
Abstract
Summary form only given. In atom lithography the conventional roles played by light and matter are reversed: a mask of light is used to pattern a beam of neutral atoms. Up to now, atom lithography has yielded only structures periodic in one or two dimensions, with a typical period of /spl lambda//2 or even below. We report the generation of various chromium structures with quadratic symmetry and the first realization of a superlattice structure using light forces.
Keywords
chromium; lithography; masks; metallic superlattices; nanotechnology; radiation pressure; AFM; Cr; atom lithography; light forces; mask of light; neutral atom beam; quadratic symmetry structures; standing light waves; superlattice writing; Arm; Atomic measurements; Chromium; Collaboration; Electrons; Hydrogen; Physics; Spontaneous emission; Superlattices; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics Conference, 2000. Conference Digest. 2000 International
Conference_Location
Nice, France
Print_ISBN
0-7803-6318-3
Type
conf
DOI
10.1109/IQEC.2000.907950
Filename
907950
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