Magnetic and Thermal Properties of MoN Underlayer for Spin Valves Depending on Nitrogen Concentration

Author

Kim, J. ; Choi, Y. ; Jo, S. ; Kim, S. ; Lee, C.

Author_Institution

Soongsil Univ., Seoul

fYear

2006

fDate

8-12 May 2006

Firstpage

518

Lastpage

518

Abstract

This article presents an investigation on the change of magnetic and thermal properties of spin valve devices for various nitrogen concentrations in MoN underlayer. Also, the properties of Mo and MoN_X thin film with those of Ta and TaN_X underlayers were compared.

Keywords

annealing; cobalt alloys; copper; iridium alloys; iron alloys; magnetic multilayers; manganese alloys; molybdenum compounds; nickel alloys; silicon; silicon compounds; spin valves; sputtered coatings; tantalum compounds; CoFe-IrMn-Ta; MoN; MoN underlayer; MoN_X thin film; Si-SiO₂-MoN-NiFe-CoFe-Cu; TaN; TaN_X underlayer; molybdenum thin film; nitrogen concentration; size 0.5 inch; size 18 A; size 21 A; size 22 A; size 25 A; size 28 A; size 35 A; size 65 A; spin valve devices; tantalum underlayer; temperature 300 degC; time 60 min; underlayer magnetic properties; underlayer thermal properties; wavelength 200 mum; wavelength 500 mum; Annealing; Fluid flow; Magnetic anisotropy; Magnetic properties; Nitrogen; Perpendicular magnetic anisotropy; Spin valves; Sputtering; Substrates; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2006. INTERMAG 2006. IEEE International

Conference_Location

San Diego, CA

Print_ISBN

1-4244-1479-2

Type

conf

DOI

10.1109/INTMAG.2006.376242

Filename

4261951