Yield prediction techniques based on DFM rules and criticality for 65nm technology and beyond

Recently, various techniques of DFM (design for manufacturing) have suggested as counter measure of yield degradation. In this paper we focused on a design rule which causes yield and device degradation, and extracted a new rule with small process margins. In addition, we evaluated the systematic failure caused by small process margin, and defined the criticality as the function of its layout design rule. We describe the techniques that designer can not only predict yield degradation, but also recognize how critical the design rules are. The Techniques enable the productions to avoid complexity of design rule and to be competitive and mainstream in the industry.