DocumentCode :
2943910
Title :
Green manufacturing process — surface pre-treatment with micro bubble cavitation
Author :
Kuo, Steven C.
Author_Institution :
Intel Microelectron. Asia Ltd., Taipei
fYear :
2007
fDate :
15-17 Oct. 2007
Firstpage :
1
Lastpage :
4
Abstract :
In this paper, an innovative process, which utilizes micro-bubble cavitation in water for surface roughening pre-treatment prior to plating or laminating, is presented. No hazardous chemical is employed to comply with green process. In semiconductor industry, this surface damaging mechanism or surface roughening is a required process with chemicals. Massive amount of water were polluted and extra time was wasted on cleaning and rinsing the roughened surfaces in post-etching process. Cavitation is the bubble generation and collapsing process observed in common water. The most critical event is that shock wave is created during collapsing and attacks nearby object or surface to cause micro-scale erosion or etching. In real world, bubble cavitation, which damages the underwater hydraulic devices such as propeller, is the most unwanted phenomena but almost unavoidable. However, the proposed process is not only an ideal alternative without chemical release to satisfy green process requirements but also a cost-effective technology on TPT (throughput time) optimization and water consumption.
Keywords :
bubbles; cavitation; environmental factors; semiconductor technology; surface treatment; bubble generation; collapsing process; green manufacturing process; innovative process; laminating; micro bubble cavitation; microbubble cavitation; plating; post-etching process; semiconductor industry; shock wave; surface damaging mechanism; surface roughening pretreatment; throughput time optimization; water consumption; Chemical hazards; Chemical industry; Chemical processes; Chemical technology; Electronics industry; Manufacturing processes; Rough surfaces; Surface contamination; Surface roughness; Water pollution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
Conference_Location :
Santa Clara, CA
ISSN :
1523-553X
Print_ISBN :
978-1-4244-1142-9
Electronic_ISBN :
1523-553X
Type :
conf
DOI :
10.1109/ISSM.2007.4446793
Filename :
4446793
Link To Document :
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