• DocumentCode
    2944233
  • Title

    Breakthrough system to optimize implant filament source usage

  • Author

    Grinfeld, Evgeny ; Paz, Eran

  • Author_Institution
    Intel Corp., Kiryat Gat
  • fYear
    2007
  • fDate
    15-17 Oct. 2007
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Information is a processed data that provides us the ability to make effective decisions. In these days, when no one is experiencing lack of data, the most valuable thing is the transformation of the data to information. In this paper we would like to present Implant source optimization system (iSOS) which was implemented in Intel HVM facility running Flash NOR technologies at Implant area. The implant area has experienced short source life duration as results of ineffective running mode of operation. This running mode has decreased the tools availability and increased the implant time which has caused lower throughput. In order to improve implant tools availability and utilization a set of "run rules" were defined by the area\´s engineers, utilizing different gases properties to extend the source\´s life. Though the run rules were well defined it was a difficult task to implement them and monitor the running history. iSOS was designed to transform mass of data from the tools into unique, effective and presentable information. By enabling fast and accurate decision making iSOS enabled Implant area to achieve additional capacity (improved availability by 4%-6%) at lower cost (saving of $10,000 per week) by doubling source life duration.
  • Keywords
    ion implantation; manufacturing data processing; optimisation; semiconductor device manufacture; semiconductor doping; Flash NOR technology; implant filament source usage; implant source optimization system; Coatings; Decision making; Electrons; Etching; Gases; Implants; Job shop scheduling; Pulp manufacturing; Radio access networks; Throughput; Filament Source; Ion Implant; MS SQL Reporting Services;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
  • Conference_Location
    Santa Clara, CA
  • ISSN
    1523-553X
  • Print_ISBN
    978-1-4244-1142-9
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • DOI
    10.1109/ISSM.2007.4446811
  • Filename
    4446811