• DocumentCode
    2945237
  • Title

    A statistical method for the characterization of bimodal electromigration distributions

  • Author

    Hau-Riege, Christine ; Lee, EunJoo ; Thierbach, Steffi ; Marathe, Amit ; Kittler, Richard

  • Author_Institution
    AMD, Sunnyvale
  • fYear
    2007
  • fDate
    15-17 Oct. 2007
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    We have developed a statistical method for analyzing bimodal electromigration distributions based on experiment and failure analysis. This method assesses whether a distribution is bimodal, and if so, determines the mode of each individual fail through a least-squares method, so that the best lognormal fit is determined for each mode. Once the modes have been separated, the electromigration performance for each mode can be explicitly determined in the usual manner. Unlike methods based on maximum likelihood estimation, this method is robust for small samples sizes, in which random subsets of a large dataset lead to statistically similar results. Further, since this method has been verified through failure analysis for multiple distributions, extensive failure analysis work can be bypassed in order to separate the entire distribution into two modes.
  • Keywords
    electromigration; failure analysis; least squares approximations; statistical analysis; bimodal electromigration distributions; failure analysis; least-squares method; statistical method; Current density; Electromigration; Electrons; Failure analysis; Maximum likelihood estimation; Robust control; Robustness; Size control; Statistical analysis; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
  • Conference_Location
    Santa Clara, CA
  • ISSN
    1523-553X
  • Print_ISBN
    978-1-4244-1142-9
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • DOI
    10.1109/ISSM.2007.4446869
  • Filename
    4446869