Title :
Start up optimization for point of use filter in lithography process
Author :
Umeda, Toru ; Tsuzuki, Shuichi ; Numaguchi, Toru ; Sato, Norio ; Yamamoto, Chikara ; Sato, Masashige
Author_Institution :
Nihon Pall Ltd., Ibaraki
Abstract :
For start up optimization of the point of use filter in lithography process, high flow dispensing and applying back pressure were revealed to be effective. The observed effectiveness of the high flow dispensing was confirmed valid in commercial test at NEC Yamagata Ltd., where remarkable reductions of BARC chemical consumption (70% reduction) and preventive maintenance time were proven. Additionally a measuring method to determine remaining air in the capsule filter developed in the study is also described.
Keywords :
lithography; semiconductor device models; capsule filter; lithography process; point of use filter; start up optimization; Air cleaners; Chemicals; Counting circuits; Filters; Lithography; National electric code; Pumps; Testing; Valves; Weight measurement;
Conference_Titel :
Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
978-1-4244-1142-9
Electronic_ISBN :
1523-553X
DOI :
10.1109/ISSM.2007.4446873
