Title :
Fabrication of photonic crystal structure in fluorine-doped silicon dioxide film by dry and wet etching processes
Author :
Kintaka, K. ; Nishii, J.
Author_Institution :
Dept. of Opt. Mater., Osaka Nat Res. Inst., Japan
Abstract :
Summary form only given. Photonic crystals have been studied extensively because of their strong potential in light control. In this paper, we propose a novel method for fabrication of two-dimensional (sub-three-dimensional) periodic structures. We demonstrate the fabrication of a prototype structure, i.e. two-dimensional array of mushroom structures.
Keywords :
etching; fluorine; optical arrays; optical fabrication; photonic band gap; silicon compounds; sputter etching; SiO/sub 2/:F; dry etching processes; fabrication; fluorine-doped silicon dioxide film; mushroom structures; photonic crystal structure; sub-three-dimensional periodic structures; two-dimensional array; two-dimensional periodic structures; wet etching processes; Dry etching; Fabrication; Photonic crystals; Semiconductor films; Silicon compounds; Wet etching;
Conference_Titel :
Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on
Conference_Location :
Nice
Print_ISBN :
0-7803-6319-1
DOI :
10.1109/CLEOE.2000.909687
