Title :
Vacuum chamber fast dehumidification ∼Water control in semiconductor manufacturing equipment∼
Author :
Yamawaku, Jun ; Moriya, Tsuyoshi ; Ryu, Yoshitaka ; Abe, Kazumasa ; Yakushiji, Hideki ; Hosaka, Yuki ; Kato, Chie
Author_Institution :
Tokyo Electron AT Ltd., Nirasaki
Abstract :
Water residues become a serious problem in semiconductor manufacturing systems. In this paper, one of the methods to dehumidify in process chamber is proposed and demonstrated. With this technique, conventional evacuation time can be improved by 2times to 3times. We also demonstrated influence of water adsorbed on wafer.
Keywords :
absorption; semiconductor device manufacture; water; process chamber; semiconductor manufacturing equipment; semiconductor manufacturing systems; vacuum chamber fast dehumidification; wafer water adsorption; water control; water residue; Semiconductor device manufacture;
Conference_Titel :
Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
978-1-4244-1142-9
Electronic_ISBN :
1523-553X
DOI :
10.1109/ISSM.2007.4446884
