DocumentCode
2947007
Title
Micromagnetic simulation of magnetic triangularly shaped nanoelement formed by nanosphere lithography
Author
Zhong, Z. ; Liu, S. ; Tang, X. ; Tang, K. ; Zhang, H.
Author_Institution
Univ. of Electron. Sci. & Technol. of China, Chengdu
fYear
2006
fDate
8-12 May 2006
Firstpage
759
Lastpage
759
Abstract
In this paper, we adopt micromagnetic simulation based minimizing the energy to study the ground state of TSN formed by NSL, and to understand the reversal magnetization mechanism of this nanostructures.The ground state and magnetization process of the triangularly shaped nanoelements formed by monolayer nanosphere lithography were simulated by micromagnetic formalism. The simulation showed that TSN had four ground states dependent on the thickness and lateral size of the nanoelement.
Keywords
ground states; magnetisation reversal; micromagnetics; monolayers; nanolithography; nanostructured materials; ground state; magnetic triangularly shaped nanoelement; micromagnetic simulation; monolayer nanosphere lithography; monolayers; nanostructure material; reversal magnetization mechanism; Anisotropic magnetoresistance; Educational institutions; Lithography; Magnetization processes; Micromagnetics; Nanostructures; Saturation magnetization; Self-assembly; Shape control; Stationary state;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location
San Diego, CA
Print_ISBN
1-4244-1479-2
Type
conf
DOI
10.1109/INTMAG.2006.376483
Filename
4262192
Link To Document