Near- and mid-infrared "Yablonovite" structures fabricated in PMMA by X-ray lithography

Author

Cuisin, C. ; Chelnokov, A. ; Chen, Yuanfeng ; Decanini, D. ; Lourtioz, J.-M.

Author_Institution

Inst. d´Electron. Fondamentale, Univ. de Paris-Sud, Orsay, France

fYear

2000

fDate

10-15 Sept. 2000

Abstract

Summary form only given. We describe the fabrication of three-dimensional (3D) photonic microstructures by high resolution X-ray lithography (XRL) as the first step toward 3D photonic band gap (PBG) materials for mid- and near-infrared wavelengths. In the soft X-ray range (/spl lambda//spl sim/1 nm), the conventional XRL mask technology can be used to fabricate 3D "Yablonovite" structures in relatively thick PMMA resist layers (from 4 to 10 /spl mu/m). A triangular lattice of holes is used as a pattern for the membrane-supported XRL mask. Several specific mask configurations were tested to solve the problems of stability and alignment related to the multiple tilt exposures.

Keywords

X-ray lithography; X-ray masks; optical fabrication; optical polymers; photonic band gap; 1 mum; 3D photonic band gap; 3D photonic microstructure fabrication; PMMA; X-ray lithography; XRL mask technology; alignment; high resolution X-ray lithography; mask configurations; membrane-supported XRL mask; mid-infrared Yablonovite structures; multiple tilt exposures; near-infrared wavelengths; soft X-ray range; stability; thick PMMA resist layers; triangular lattice; Fabrication; Lattices; Photonics; Resists; Stability; Sun; Synchrotron radiation; Vacuum arcs; X-ray lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on

Conference_Location

Nice

Print_ISBN

0-7803-6319-1

Type

conf

DOI

10.1109/CLEOE.2000.909786

Filename

909786