Near- and mid-infrared "Yablonovite" structures fabricated in PMMA by X-ray lithography

Summary form only given. We describe the fabrication of three-dimensional (3D) photonic microstructures by high resolution X-ray lithography (XRL) as the first step toward 3D photonic band gap (PBG) materials for mid- and near-infrared wavelengths. In the soft X-ray range (/spl lambda//spl sim/1 nm), the conventional XRL mask technology can be used to fabricate 3D "Yablonovite" structures in relatively thick PMMA resist layers (from 4 to 10 /spl mu/m). A triangular lattice of holes is used as a pattern for the membrane-supported XRL mask. Several specific mask configurations were tested to solve the problems of stability and alignment related to the multiple tilt exposures.