DocumentCode
294939
Title
Thermal modeling and control of rapid thermal processing systems
Author
Ebert, J.L. ; Emami-Naeini, A. ; Aling, H. ; Kosut, R.L.
Author_Institution
Integrated Syst. Inc., Santa Clara, CA, USA
Volume
2
fYear
1995
fDate
13-15 Dec 1995
Firstpage
1304
Abstract
Rapid thermal processing (RTP) is becoming increasingly more important in semiconductor wafer fabrication. A nonlinear physical model for a generic RTP system is described. This generic RTP system is representative of the state-of-the-art RTP systems. A low-order nonlinear model is developed. A model-based LQG controller is designed for the low-order model which successfully controls the full-order nonlinear simulation model
Keywords
control system synthesis; linear quadratic Gaussian control; process control; rapid thermal processing; reduced order systems; full-order nonlinear simulation model; low-order nonlinear model; model-based LQG controller; nonlinear physical model; rapid thermal processing systems; semiconductor wafer fabrication; thermal modeling; Control systems; Fabrication; Fluid flow; Heat transfer; Lamps; Nonlinear control systems; Rapid thermal processing; Semiconductor device modeling; Silicon; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Decision and Control, 1995., Proceedings of the 34th IEEE Conference on
Conference_Location
New Orleans, LA
ISSN
0191-2216
Print_ISBN
0-7803-2685-7
Type
conf
DOI
10.1109/CDC.1995.480278
Filename
480278
Link To Document