Title :
Studies on the carrier transport in InGaAlAsP-InGaAsP quantum well structures emitting at 1.3 /spl mu/m
Author :
Campi, R. ; Marcinkevicius, S. ; Landgren, G.
Author_Institution :
Dept. of Electron., R. Inst. of Technol., Stockholm, Sweden
Abstract :
Summary form only given. Interwell carrier distribution is a process of major importance for the operation of multiple quantum well (MQW) lasers. In this work we examine a novel approach to improve high temperature performance in the InGaAsP lasers by adding aluminium to the barrier, which allows one to increase conduction band offset. To find optimal heterostructure parameters, different barrier material compositions have been examined in structures with InGaAsP compressively strained wells and tensile strained InGaAlAsP barriers. The MQW structures were fabricated by low pressure MOVPE. They contained four period transport-MQWs emitting at 1.3 /spl mu/m. The interwell carrier transport was measured by time resolved photoluminescence (PL) in a specially designed structures.
Keywords :
III-V semiconductors; MOCVD; aluminium compounds; carrier mobility; gallium arsenide; indium compounds; infrared sources; laser transitions; photoluminescence; quantum well lasers; vapour phase epitaxial growth; 1.3 mum; InGaAlAsP-InGaAsP; InGaAlAsP/InGaAsP quantum well structures; InGaAsP compressively strained wells; MQW lasers; aluminium; barrier material compositions; carrier transport; conduction band offset; high temperature performance; interwell carrier distribution; interwell carrier transport; low pressure MOVPE; multiple quantum well; optimal heterostructure parameters; tensile strained InGaAlAsP barriers; time resolved photoluminescence; Aluminum; Composite materials; Conducting materials; Epitaxial growth; Epitaxial layers; Optical materials; Quantum well devices; Quantum well lasers; Temperature; Time measurement;
Conference_Titel :
Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on
Conference_Location :
Nice
Print_ISBN :
0-7803-6319-1
DOI :
10.1109/CLEOE.2000.909932