DocumentCode :
2950131
Title :
Control and enhancement of graphene sensitivity by engineering edge defects
Author :
Xuebin Tan ; Huard, C. ; Hsun-Jen Chuang ; Ming-Wei Lin ; Zhixian Zhou ; Cheng, Mark Ming-Cheng
Author_Institution :
Electr. & Comput. Eng, Wayne State Univ., Detroit, MI, USA
fYear :
2012
fDate :
28-31 Oct. 2012
Firstpage :
1
Lastpage :
4
Abstract :
This paper presents a novel design to control defect sites and to enhance sensitivity in graphene-based pH and biological sensors. We showed that pristine graphene was not sensitive to the pH. We demonstrated that the pH sensitivity of graphene could be controlled by varying the patterns and lengths of edges that were created using simple processes of photolithography and dry etching.
Keywords :
biosensors; chemical sensors; etching; field effect transistors; graphene; pH measurement; photolithography; C; biological sensor; defect site control; dry etching; engineering edge defects; graphene based pH sensor; graphene sensitivity; photolithography process; Copper; FETs; Graphene; Image edge detection; Logic gates; Sensitivity; Sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Sensors, 2012 IEEE
Conference_Location :
Taipei
ISSN :
1930-0395
Print_ISBN :
978-1-4577-1766-6
Electronic_ISBN :
1930-0395
Type :
conf
DOI :
10.1109/ICSENS.2012.6411386
Filename :
6411386
Link To Document :
بازگشت