Debris free sub-/spl mu/m structuring of arylazophosphonate containing polymers by XeCl excimer laser ablation

Author

Beinhorn, F. ; Ihlemann, J. ; Nobis, M.N. ; Nuyken, O.

Author_Institution

Laser-Laboratorium Gottingen eV, Germany

fYear

2000

fDate

10-15 Sept. 2000

Abstract

Summary form only given. Poly(arylazophosphonate)s are photolabile polymers with sufficient absorption at 308 nm to be patterned by XeCl laser ablation. Photoinduced fragmentation is accompanied by generation of molecular nitrogen supporting the ablation process. Practically no debris is found on the ablation site or on the surrounding area. Irradiating the polymer films through a phase mask in a proximity configuration, large area relief gratings with a period in the sub-/spl mu/m range are formed.

Keywords

absorption coefficients; laser ablation; optical fabrication; optical polymers; phase shifting masks; photodissociation; 308 nm; XeCl excimer laser ablation; absorption saturation; arylazophosphonate containing polymers; bond breaking; chromophores contribution; debris-free submicron structuring; dynamic absorption coefficient; fluence dependence; large area relief gratings; molecular nitrogen generation; phase mask; photoinduced fragmentation; photolabile polymers; polyarylazophosphonates; proximity configuration; Polymers;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on

Conference_Location

Nice

Print_ISBN

0-7803-6319-1

Type

conf

DOI

10.1109/CLEOE.2000.909972

Filename

909972