Title :
Debris free sub-/spl mu/m structuring of arylazophosphonate containing polymers by XeCl excimer laser ablation
Author :
Beinhorn, F. ; Ihlemann, J. ; Nobis, M.N. ; Nuyken, O.
Author_Institution :
Laser-Laboratorium Gottingen eV, Germany
Abstract :
Summary form only given. Poly(arylazophosphonate)s are photolabile polymers with sufficient absorption at 308 nm to be patterned by XeCl laser ablation. Photoinduced fragmentation is accompanied by generation of molecular nitrogen supporting the ablation process. Practically no debris is found on the ablation site or on the surrounding area. Irradiating the polymer films through a phase mask in a proximity configuration, large area relief gratings with a period in the sub-/spl mu/m range are formed.
Keywords :
absorption coefficients; laser ablation; optical fabrication; optical polymers; phase shifting masks; photodissociation; 308 nm; XeCl excimer laser ablation; absorption saturation; arylazophosphonate containing polymers; bond breaking; chromophores contribution; debris-free submicron structuring; dynamic absorption coefficient; fluence dependence; large area relief gratings; molecular nitrogen generation; phase mask; photoinduced fragmentation; photolabile polymers; polyarylazophosphonates; proximity configuration; Polymers;
Conference_Titel :
Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on
Conference_Location :
Nice
Print_ISBN :
0-7803-6319-1
DOI :
10.1109/CLEOE.2000.909972
