Title :
Metal-oxide-semiconductor light-emitting diodes at Si bandgap energy
Author :
Miin-Jang Chen ; Ching-Fuh Lin ; Jiann Jong Chiu ; Cheewee Liu ; Shu-Wei Chang
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
Summary form only given. We report a simple way of electroluminescence from Si. The structure is the same as the conventional metal-oxide-semiconductor (MOS) structure. The oxide is very thin so that carriers could tunnel through the oxide and make the device behave like a diode. Under forward bias, the MOS structure emit light at bandgap energy of Si. Increasing applied voltages, the emission at Si bandgap energy gradually vanishes and, meanwhile, shifts to wavelengths longer than 1200 nm. We shows a spectrum measure from MOS on n-type Si. The MOS structures made on both n-type and p-type Si have similar light-emitting behaviors. The simplicity of emitting light from both p-type and n-type silicon should make silicon an extremely powerful material for applications in optics.
Keywords :
MIS structures; electroluminescence; light emitting diodes; optical fabrication; silicon; MOS structure; MOS structures; Si; Si bandgap energy; applied voltages; bandgap energy; electroluminescence; forward bias; light-emitting behavior; metal-oxide-semiconductor; metal-oxide-semiconductor light-emitting diode; n-type Si; p-type Si; tunnel; Electroluminescence; Electronics industry; Light emitting diodes; Optical materials; Photonic band gap; Power engineering and energy; Silicon; Stimulated emission; Voltage; Wavelength measurement;
Conference_Titel :
Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on
Conference_Location :
Nice
Print_ISBN :
0-7803-6319-1
DOI :
10.1109/CLEOE.2000.910040