Title :
High repetition rate microsecond pulse generation for material processing using a planar waveguide CO/sub 2/ MOPA system
Author :
Cao, Q. ; Baker, H.J. ; Hall, D.R.
Author_Institution :
Dept. of Phys., Heriot-Watt Univ., Edinburgh, UK
Abstract :
Summary form only given. Using pulse widths between 1 and 20 /spl mu/s and materials which are strongly absorbing at the 10.6 /spl mu/m wavelength, the penetration depth of heating can be minimised whilst avoiding the severe plasma screening effects associated with sub-microsecond irradiation. We present development of the RF excited planar waveguide technology to produce sealed-off, static gas sources for this intermediate processing window. We have developed a 7-pass CO/sub 2/ planar waveguide amplifier system aimed at providing high peak power, short duration laser pulses of good beam quality.
Keywords :
carbon compounds; gas lasers; laser materials processing; optical pulse generation; waveguide lasers; 1 to 20 mus; 10.6 mum; 7-pass CO/sub 2/ planar waveguide amplifier system; CO/sub 2/; RF excited planar waveguide technology; good beam quality; high peak power; high repetition rate microsecond pulse generation; intermediate processing window; laser materials processing; penetration depth; planar waveguide CO/sub 2/ MOPA system; pulse widths; sealed-off static gas sources; short duration laser pulses; strongly absorbing; sub-microsecond irradiation; Heating; Planar waveguides; Plasma displays; Plasma materials processing; Plasma sources; Plasma waves; Pulse amplifiers; Pulse generation; Radio frequency; Space vector pulse width modulation;
Conference_Titel :
Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on
Conference_Location :
Nice
Print_ISBN :
0-7803-6319-1
DOI :
10.1109/CLEOE.2000.910059
