DocumentCode
2951983
Title
A new of photo-cleaning technique for semiconductor wafers with vacuum ultraviolet excimer lamps
Author
Yokotani, A. ; Maezono, Y. ; Motokawa, Y. ; Fujimoto, K. ; Kurosawa, K.
Author_Institution
Fac. of Eng., Miyazaki Univ., Japan
fYear
2000
fDate
10-15 Sept. 2000
Abstract
Summary form only. A new photo-cleaning technique of organic contamination on silicon wafers utilizing excimer lamps has been developed. A decomposition rate of 20 /spl mu/g/min/spl middot/cm/sup 2/ has been achieved.
Keywords
X-ray optics; lamps; semiconductor technology; surface cleaning; decomposition rate; excimer lamps; organic contamination; photo-cleaning technique; semiconductor wafers; vacuum ultraviolet excimer lamps; Lamps; Vacuum technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on
Conference_Location
Nice
Print_ISBN
0-7803-6319-1
Type
conf
DOI
10.1109/CLEOE.2000.910073
Filename
910073
Link To Document