DocumentCode :
2951983
Title :
A new of photo-cleaning technique for semiconductor wafers with vacuum ultraviolet excimer lamps
Author :
Yokotani, A. ; Maezono, Y. ; Motokawa, Y. ; Fujimoto, K. ; Kurosawa, K.
Author_Institution :
Fac. of Eng., Miyazaki Univ., Japan
fYear :
2000
fDate :
10-15 Sept. 2000
Abstract :
Summary form only. A new photo-cleaning technique of organic contamination on silicon wafers utilizing excimer lamps has been developed. A decomposition rate of 20 /spl mu/g/min/spl middot/cm/sup 2/ has been achieved.
Keywords :
X-ray optics; lamps; semiconductor technology; surface cleaning; decomposition rate; excimer lamps; organic contamination; photo-cleaning technique; semiconductor wafers; vacuum ultraviolet excimer lamps; Lamps; Vacuum technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Europe, 2000. Conference Digest. 2000 Conference on
Conference_Location :
Nice
Print_ISBN :
0-7803-6319-1
Type :
conf
DOI :
10.1109/CLEOE.2000.910073
Filename :
910073
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2951983
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