Title :
Performance analysis of multi-VT design solutions in 28nm UTBB FD-SOI technology
Author :
Pelloux-Prayer, B. ; Blagojevic, Marjan ; Haendler, S. ; Valentian, Alexandre ; Amara, A. ; Flatresse, Philippe
Author_Institution :
STMicroelectron. Crolles, Crolles, France
Abstract :
UTBB FD-SOI technology is able to reach very high speeds thanks to flip-Wells variant which enables low-VT (LVT) tuning. This approach appears to be the best design option to catch high CPU frequencies or/and optimal energy consumption. To save power when logical paths are not critical, regular-VT (RVT) transistors, which seat on classical-Wells, cannot be abutted to LVT transistors because of the Well bias conflicts. To overcome these multi-VT constraints, several innovative cointegration schemes based on single-Well (SW) approaches have been designed in 28nm UTBB FD-SOI technology and validated by silicon results.
Keywords :
integrated circuit design; silicon-on-insulator; LVT transistors; LVT tuning; UTBB FD-SOI technology; Well bias conflicts; fully depleted silicon-on-insulator; performance analysis; single-Well approach; size 28 nm; threshold voltage; utra-thin body buried oxide; Delays; Energy efficiency; Logic gates; Silicon; Standards; Transistors; Tuning;
Conference_Titel :
SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2013 IEEE
Conference_Location :
Monterey, CA
DOI :
10.1109/S3S.2013.6716548