Title :
Fabrication of SiGe DBR mirrors and microcavities
Author :
Kawaguchi, K. ; Shiraki, Y.
Author_Institution :
Fujitsu Labs. Ltd., Kanagawa, Japan
fDate :
29 Sept.-1 Oct. 2004
Abstract :
In this work, strain-balanced SiGe/Si DBRs are fabricated on the relaxed SiGe virtual substrates, and their structural and optical properties are investigated. Moreover, SiGe planar microcavity structures with Si/Ge quantum wells (QWs) or Ge quantum dots (QDs) are fabricated as an application of SiGe/Si DBRs.
Keywords :
Ge-Si alloys; distributed Bragg reflectors; integrated optics; micro-optics; microcavities; optical fabrication; photoluminescence; semiconductor growth; semiconductor quantum dots; semiconductor quantum wells; DBR mirrors; Ge quantum dots; Si/Ge quantum wells; SiGe; SiGe mirrors; SiGe planar microcavity; SiGe-Si; microcavities; optical fabrication; optical properties; photoluminescence; relaxed SiGe virtual substrates; strain-balanced SiGe/Si DBR; structural properties; Capacitive sensors; Distributed Bragg reflectors; Fabrication; Germanium silicon alloys; Luminescence; Microcavities; Mirrors; Reflectivity; Silicon germanium; Substrates;
Conference_Titel :
Group IV Photonics, 2004. First IEEE International Conference on
Print_ISBN :
0-7803-8474-1
DOI :
10.1109/GROUP4.2004.1416643
