DocumentCode
2956203
Title
The generalized model of plasma technological system node and its applications
Author
Geller, V.M. ; Khrustalev, V.A. ; Vantsev, D.V.
Author_Institution
Novosibirsk State Technical University, Russia
fYear
2007
fDate
3-6 Oct. 2007
Firstpage
307
Lastpage
309
Abstract
In practical problems of plasma technology an engineer is often confronted with complicated character of plasma. processes taking place in a plasma reactor. It must take into consideration some factors caused with as the plasma processes as the constructive and geometrical characteristics of technological reactors -and processing items. The plasma process control problem may be noticeably simplified with using simplifying models of plasma effects existing in plasma device and reactor inner space. One of such models will be proposed and analyzed this paper.
Keywords
Conductivity; Equations; Frequency; Inductors; Insulation; Plasma applications; Plasma devices; Plasma materials processing; Plasma properties; Plasma waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Strategic Technology, 2007. IFOST 2007. International Forum on
Conference_Location
Mongolia
Print_ISBN
978-1-4244-3589-0
Electronic_ISBN
978-1-4244-1831-2
Type
conf
DOI
10.1109/IFOST.2007.4798590
Filename
4798590
Link To Document