• DocumentCode
    2956203
  • Title

    The generalized model of plasma technological system node and its applications

  • Author

    Geller, V.M. ; Khrustalev, V.A. ; Vantsev, D.V.

  • Author_Institution
    Novosibirsk State Technical University, Russia
  • fYear
    2007
  • fDate
    3-6 Oct. 2007
  • Firstpage
    307
  • Lastpage
    309
  • Abstract
    In practical problems of plasma technology an engineer is often confronted with complicated character of plasma. processes taking place in a plasma reactor. It must take into consideration some factors caused with as the plasma processes as the constructive and geometrical characteristics of technological reactors -and processing items. The plasma process control problem may be noticeably simplified with using simplifying models of plasma effects existing in plasma device and reactor inner space. One of such models will be proposed and analyzed this paper.
  • Keywords
    Conductivity; Equations; Frequency; Inductors; Insulation; Plasma applications; Plasma devices; Plasma materials processing; Plasma properties; Plasma waves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Strategic Technology, 2007. IFOST 2007. International Forum on
  • Conference_Location
    Mongolia
  • Print_ISBN
    978-1-4244-3589-0
  • Electronic_ISBN
    978-1-4244-1831-2
  • Type

    conf

  • DOI
    10.1109/IFOST.2007.4798590
  • Filename
    4798590