DocumentCode :
2956203
Title :
The generalized model of plasma technological system node and its applications
Author :
Geller, V.M. ; Khrustalev, V.A. ; Vantsev, D.V.
Author_Institution :
Novosibirsk State Technical University, Russia
fYear :
2007
fDate :
3-6 Oct. 2007
Firstpage :
307
Lastpage :
309
Abstract :
In practical problems of plasma technology an engineer is often confronted with complicated character of plasma. processes taking place in a plasma reactor. It must take into consideration some factors caused with as the plasma processes as the constructive and geometrical characteristics of technological reactors -and processing items. The plasma process control problem may be noticeably simplified with using simplifying models of plasma effects existing in plasma device and reactor inner space. One of such models will be proposed and analyzed this paper.
Keywords :
Conductivity; Equations; Frequency; Inductors; Insulation; Plasma applications; Plasma devices; Plasma materials processing; Plasma properties; Plasma waves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Strategic Technology, 2007. IFOST 2007. International Forum on
Conference_Location :
Mongolia
Print_ISBN :
978-1-4244-3589-0
Electronic_ISBN :
978-1-4244-1831-2
Type :
conf
DOI :
10.1109/IFOST.2007.4798590
Filename :
4798590
Link To Document :
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