DocumentCode :
2956383
Title :
Electrostatic discharge (ESD) sensitivity of thin films hybrid passive components
Author :
Lai, T.T.
Author_Institution :
AT&T Bell Lab., Allentown, PA, USA
fYear :
1989
fDate :
22-24 May 1989
Firstpage :
229
Lastpage :
239
Abstract :
The electrostatic discharge (ESD) sensitivities of thin-film passive components from various hybrid integrated circuits were characterized using two models: the human body model (HBM) and the charge device model (CDM). It was found that thin-film Au conductors made with a minimum linewidth of 60 μm were insensitive to ESD of 3000 V. Capacitors failed HBM voltages as low as 300 V when tested according to a specification that calls for multiple HBM discharges. However, this test procedure was not indicative of the capacitors´ ESD robustness due to a cumulative effect of the capacitors´ ESD charging voltages. Low-resistivity resistors were sensitive to ESD voltages as low as 600 V. High-resistivity resistors, when not RTV (room temperature vulcanization) encapsulated, were damaged due to arcing at lower ESD voltages than when encapsulated. On the basis of the experimental results and analysis, design rules for ESD robust low-resistivity resistors are recommended and a new meander resistor design is proposed
Keywords :
electrostatic discharge; failure analysis; hybrid integrated circuits; modelling; sensitivity; thin film circuits; 300 V; 3000 V; 60 micron; 600 V; ESD charging voltages; ESD robustness; ESD sensitivity; ESD voltages; arcing damage; capacitor; charge device model; design rules; electrostatic discharge; failure mode analysis; high resistivity resistors; human body model; hybrid integrated circuits; low-resistivity resistors; meander resistor design; minimum linewidth; multiple HBM discharges; room temperature vulcanization encapsulation; test procedure; thin film Au conductors; thin-film passive components; Biological system modeling; Capacitors; Electrostatic discharge; Integrated circuit modeling; Low voltage; Resistors; Robustness; Thin film circuits; Thin film devices; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components Conference, 1989. Proceedings., 39th
Conference_Location :
Houston, TX
Type :
conf
DOI :
10.1109/ECC.1989.77756
Filename :
77756
Link To Document :
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