DocumentCode
2956668
Title
Fabrication of integrated waveguide turning mirror on silicon-on-insulator
Author
Wang, Wenhui ; Tang, Yanzhe ; Yang, Yirong ; Tie Li ; Wu, Yaming ; Yang, Jianyi ; Wang, Yuelin
Author_Institution
Shanghai Inst. of Microsyst. & Inf. Technol., Chinese Acad. of Sci., Shanghai, China
fYear
2004
fDate
29 Sept.-1 Oct. 2004
Firstpage
156
Lastpage
158
Abstract
In this paper, based on the inductively coupled plasma (ICP) etching and KOH wet etching techniques, the fabrication of integrated waveguide turning mirror (IWTMs) is presented.
Keywords
integrated optics; mirrors; optical fabrication; optical waveguide components; silicon-on-insulator; sputter etching; KOH wet etching; inductively coupled plasma; integrated waveguide turning mirror; silicon-on-insulator; Dry etching; Integrated optics; Mirrors; Optical device fabrication; Optical devices; Optical waveguide theory; Optical waveguides; Silicon on insulator technology; Turning; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2004. First IEEE International Conference on
Print_ISBN
0-7803-8474-1
Type
conf
DOI
10.1109/GROUP4.2004.1416715
Filename
1416715
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