DocumentCode
2956824
Title
Three-dimensional silicon-based photonic crystals fabricated by electrochemical etching
Author
Matthias, S. ; Müller, E. ; Hillebrand, R. ; Schilling, J. ; Gösele, U.
Author_Institution
Max-Planck-Inst. of Microstructure Phys., Halle, Germany
fYear
2004
fDate
29 Sept.-1 Oct. 2004
Firstpage
168
Lastpage
170
Abstract
We show a general concept to structure standard silicon wafers with an almost perfect three-dimensional shape, which is versatile, accurate and fast. For characterisation we grow photonic crystals with a complete photonic bandgap.
Keywords
electrochemistry; elemental semiconductors; etching; optical fabrication; photonic band gap; photonic crystals; silicon; Si; electrochemical etching; photonic bandgap; three-dimensional silicon-based photonic crystals; Dielectric materials; Etching; Lattices; Microstructure; Optoelectronic and photonic sensors; Photonic band gap; Photonic crystals; Physics; Shape; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2004. First IEEE International Conference on
Print_ISBN
0-7803-8474-1
Type
conf
DOI
10.1109/GROUP4.2004.1416723
Filename
1416723
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