Title :
Three-dimensional silicon-based photonic crystals fabricated by electrochemical etching
Author :
Matthias, S. ; Müller, E. ; Hillebrand, R. ; Schilling, J. ; Gösele, U.
Author_Institution :
Max-Planck-Inst. of Microstructure Phys., Halle, Germany
fDate :
29 Sept.-1 Oct. 2004
Abstract :
We show a general concept to structure standard silicon wafers with an almost perfect three-dimensional shape, which is versatile, accurate and fast. For characterisation we grow photonic crystals with a complete photonic bandgap.
Keywords :
electrochemistry; elemental semiconductors; etching; optical fabrication; photonic band gap; photonic crystals; silicon; Si; electrochemical etching; photonic bandgap; three-dimensional silicon-based photonic crystals; Dielectric materials; Etching; Lattices; Microstructure; Optoelectronic and photonic sensors; Photonic band gap; Photonic crystals; Physics; Shape; Silicon;
Conference_Titel :
Group IV Photonics, 2004. First IEEE International Conference on
Print_ISBN :
0-7803-8474-1
DOI :
10.1109/GROUP4.2004.1416723
