Title :
A new fabrication method of micro-grating and its application to long wavelength distributed feedback laser diode
Author :
Park, Chongdae ; Kim, Hyung Mun ; Oh, Dae Kon ; Kim, Jeong Soo ; Choo, Heung Ro ; Kim, Hongman ; Pyun, Kwang Eui
Author_Institution :
Optoelectron. Sect., Electron. & Telecommun. Res. Inst., Taejeon, South Korea
Abstract :
Summary form only given. Tne fabrication technology of the first order InP grating has been one of the important steps to make long wavelength distributed feedback [DFB] laser diodes. In this paper, the rectangular grating is fabricated from an intermediate SiNx layer on InP substrate by using the conventional holographic exposure and RIE. To our knowledge, our process is the first report that SiNx layer is utilized not only as the image transferred layer from photoresist layer but also as the mask layer for InP dry etching
Keywords :
III-V semiconductors; distributed feedback lasers; holographic gratings; holography; indium compounds; optical fabrication; optical images; photoresists; semiconductor lasers; sputter etching; DFB laser diodes; InP; InP dry etching; RIE; SiN; SiNx layer; conventional holographic exposure; first order InP grating; image transferred layer; intermediate SiNx layer; laser diode fabrication methods; long wavelength distributed feedback laser diode; mask layer; micro-grating; photoresist layer; rectangular grating; Diode lasers; Gratings; Holography; Indium phosphide; Optical device fabrication; Resists; Shape; Silicon compounds; Wet etching; Writing;
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1995. 8th Annual Meeting Conference Proceedings, Volume 1., IEEE
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-2450-1
DOI :
10.1109/LEOS.1995.484864
